 |
|
|
|
|
|
|
|
|
 |
|
|||||||
 |
 |
 |
|
|||||
 |
|
|||||||
 |
 |
 |
|
|||||
 |
|
|||||||
 |
 |
 |
|
|||||
 |
|
|||||||
 |
 |
|
||||||
 |
|
|||||||
 |
 |
|
||||||
 |
|
|||||||
|
The OAI Model 200 IR Mask Aligner and UV Exposure System
is a bench top tool that requires minimal clean room space.
It is a cost effective alternative for R&D or limited scale, pilot
production. Utilizing an innovative, air bearing / vacuum chuck leveling
system, the substrate is leveled quickly and gently, for parallel
photomask alignment and uniform contact across the wafer during contact
exposure. The model 200 IR mask aligner is capable of one micron resolution and alignment
precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z axis. The Model 200 Frontside Mask Aligner can be fitted with backside IR. The IR illumination vacuum chuck can be configured for alignment of whole wafers or pieces. The Model 200 bench top mask aligner features a dependable OAI light source that provides collimated UV light in Near or Deep UV using lamps ranging in power from 200 to 2000 watts. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. Changes may be made to the UV wavelength quickly and easily. The Model 200 is a flexible, economic solution for any entry level mask alignment and UV exposure application in MEMS, Microfluidics and NIL. Click here for features and specifications Click here to return to product selection page |