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| Originally
designed for use with the Series 100, 200 and 300 Perkin-Elmer Projection
Mask Aligners, the microprocessor-based Model 316 Exposure Analyzer
monitor allows storage and recall of multiple exposure parameters
(intensity, energy, and time) collected from the exposure series.
It calculates percent deviation and averages energy. AC or battery
operation. For 310, 365, 380, 400, and 436 nm wavelengths. Other wavelengths
are available. Click here for model 316 features and specifications Click here to return to product selection page |