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| Originally
designed for use with the Series 500 and 600 ASML
(SVG/Perkin-Elmer) Projection Mask Aligners,
the microprocessor-based Model 317 Exposure Analyzer monitor allows
storage and recall of multiple exposure parameters (intensity, energy,
and time) collected from the exposure series. It calculates percent
deviation and averages energy. AC or battery operation. For 310, 365,
380, 400, and 436 nm wavelengths. Other wavelengths are available.
Click here for model 317 features and specifications Click here to return to product selection page |