A versatile front and backside mask aligner, the Model 500 IR
is a high-resolution precise front to backside lithography system. It features
a family of interchangeable modular subsystems which include a choice of light
source with intensity controlling power supplies, mask and substrate holders,
and viewing optics. This cost-effective design enables the user to adapt quickly
and easily to changing requirements and is ideal for both standard as well as unique
applications. It is also available with the optional nanoimprint lithography module
or the module for liquid photopolymer microfluidics, and can be changed to near,
mid and Deep UV spectrums quickly. The mask aligner can process a wide range of materials
including glass and ceramics ranging in size from 5mm to 200mm, has an IR backside
alignment capabilities for Bulk MEMS applications, and can be a contact mask aligner.
The Model 500 alignment tooling incorporates interchangeable mask/substrate
chuck capability, differential micrometer or motorized electronic
motions for the X, Y, and Theta axes, and an adjustable electronic
clutch for setting substrate-to-mask pressure. This system utilizes
a pneumatic load/unload mask assembly, and is available with single
or split-field optics. The Series 500 features a processor interface
and integrated vibration isolation system. The system may be operated
in manual or semiautomatic modes. The laboratory-grade console provides
the operator with ample work and storage areas. Unexcelled in long
term reliability, versatility and ease of use, the Model 500 Mask
Alignment and Exposure System is a powerful tool that combines functionality
and low cost of ownership.
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