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| The Model
600 Large Substrate Mask Aligner System has many unique features making
it highly versatile. It can be configured to suit the users unique
needs and is an excellent choice for ceramics, flat panels and Fodel™.
The system has a wide range of options including special alignment
optics, pressure sensitive chucks (for use with brittle substrates),
and multi-spectral exposure systems which allow the user to select
the exposing wavelength (Near UV, Mid UV or Deep UV). With its ability
to interchange subsystem modules, the system can be configured to
meet standard applications as well as many unusual requirements.
Light Sources can be configured up to 5KW for
substrates up to 20 inches square using mirrored optics. Click here for features and specifications Click here to return to product selection page |