INTRODUCTION OF NEW UV LIGHT SOURCE GRANDE FOR LARGE SUBSTRATES OVER 18"

OAI EXPANDS ITS SUCCESSFUL LIGHT SOURCE SYSTEM TO ACCOMODATE THE NEW DISPLAYS

January 12, 2005, San Jose, CA: OAI announces the expansion of its successful line of UV Light Sources to handle larger substrates over 18"x 18". The new UV LIGHT SOURCE GRANDE (LSG) combines all the technical features of OAI's standard Light Sources with the latest most innovative design and engineering to meet the demands of its customers in today's ever changing markets. Collimating mirrors are used instead of collimating lenses when the substrate size is 18" or more. The LSG systems have collimating half angles of less than 2 degrees combined with exceptional uniformity. LSG is now available in 5 and 8 kW with constant intensity controllers.

The new LSG is installed and being used successfully in the United States, China and Taiwan. Applications include UV exposure of substrates for displays and for multisubstrates under one exposure. The LSG combined with OAI's alignment system is used in Fodelª applications.

"Our customers have increased their substrate sizes. OAI's new collimating mirror light sources meet their latest specifications," said Dr. Charles Turk, President of OAI. "We offer LSG systems for direct sales or OEM," he added.

OAI UV Exposure Systems are known for long term reliability and high efficiency. They are designed to facilitate conversion from one wavelength region to another and are available with a wide variety of bandpass mirror sets. The system can be used as a stand alone, part of an OEM system or incorporated into any OAI mask aligner.

OAI is a leading manufacturer of precision equipment used in the semiconductor, MEMS, and compound semiconductor industries for 30 years.

For further information contact OAI:
685 River Oaks Parkway,
San Jose, Ca 95134
Phone 408/232-060
Email: sales@oainet.com
www.oainet.com.

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