LOW-COST BACKSIDE ALIGNER INTRODUCED BY OAI

Optical Backside Alignment At An IR Price

March 15, 2005: In response to customers needs, OAI introduces the new Manual Backside Alignment System (MBA) that has the advantage of optical backside capability with the price tag of an IR system. The MBA has 4-camera ultra precise optical backside alignment with 1-2 micron accuracy. In IR systems the accuracy is only 3-5 microns. Other features of the MBA include a touch screen interface that is PLC controlled and the ability to handle a wide range of substrates in a variety of conventional and irregular shapes.

The new MBA is engineered with OAI's proven components that made it a leader for over 30 years in precision lithography equipment. It features the dependable OAI Series 30 light source, intensity controlled power supply and ease of operation with built in flexibility. With a small footprint of 50"x32", the MBA fits into any facility. This model is tabletop; however, it comes with the option of a vibration isolation table.

By having a low price tag with precision engineering, the MBA is a perfect lithography tool for Universities, R&D facilities, and start-up companies. It can be used in MEMS, Semiconductor, Microfluidics, and Nanotechnology.

OAI is located in the heart of Silicon Valley. It develops and manufactures standard and specialized precision mask aligners, UV Exposure Systems and custom-engineered systems.

For further information contact OAI:
685 River Oaks Parkway,
San Jose, Ca 95134
Phone 408/232-060
Email: sales@oainet.com
www.oainet.com.

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