OAI ENTERS INTO LICENSE AGREEMENT WITH THE UNIVERSITY OF COLORADO TO FABRICATE 3D PHOTOPOLYMETRIC MICROFLUIDIC DEVICES

TECHNOLOGY IS MARKED IMPROVEMENT OVER SOFT LITHOGRAPHY & EMBOSSING TECHNIQUES

San Jose, CA - (February 25, 2004) - OAI announced today that it executed a license agreement with the University of Colorado in the area of fabrication of 3D photopolymeric microfluidic devices. OAI worked with university faculty and staff members to design UV exposure equipment, which is used in the production of these special microfluidic devices "The process and materials developed at the university are a marked improvement over both soft lithography and embossing techniques for the fabrication of microfluidic devices" said Dr. Charles Turk, President of OAI. "This process and equipment facilitates the production of 3D-microfluidic devices which leads to new applications and markets. It is, also, particularly well suited for rapid prototyping", added Dr. Turk.

The licensed process developed at the University of Colorado, under the direction of Professors Kristi Anseth and Professor and Chair Christopher Bowman, both of the Department of Chemical and Biochemical Engineering, is an advanced Contact Liquid Photopolymerization process, "CliPP". CLiPP is currently being used to fabricate microfluidic devices for novel biological applications as well as environmental monitoring, lab-on-a-chip, medical, and biochemical applications. The process offers unique benefits that include better aspect ratios, modifiable surfaces, use of multiple materials, and low fabrication costs.

The process and devices will be competitive with many of the current microfluidic devices and arrays, and offers a technology to expand the microfluidic market. In combination with OAIÕs advanced UV exposure system, CliPP can be scaled up for production. OAI is aiming to sublicense this technology, along with the OAI advanced equipment, to other companies to develop and produce next generation microfluidic devices. Professor Bowman pointed out "The polymerization expertise at UC-Boulder combined with OAIÕs vast experience in photolithography equipment form a solid foundation for future development of light weight and robust polymeric microfluidic devices."

OAI develops and manufactures standard and specialized precision mask aligners, UV exposure systems, light sources, and custom-engineered systems for the Microfluidics, MEMS, and Semiconductor Industries.

For further information contact OAI:
685 River Oaks Parkway,
San Jose, Ca 95134
Phone 408/232-060
Email: sales@oainet.com
www.oainet.com.

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