Nanoimprint Technology (NIL)
The OAI Nanoimprint System is a modular add-on that may be used on any OAI mask aligner. This innovative technology was developed at Hewlett Packard as a low-cost solution for research and development efforts. It enables the use of high-yield mold release technology and is the most economical solution to NIL.
Nanoimprint Module
Aligner add-on for NIL with high yield release technology