oai nanoimprint technology (NIL)

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oai nanoimprint moduleNanoimprint Module
Mask Aligner add-on for NIL with high yield release technology

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Nanoimprint Technology (NIL)

The OAI Nanoimprint System is a modular add-on that may be used on any OAI mask Aligner. This innovative technology was developed at Hewlett Packard as a low-cost solution for research and development efforts. It enables the use of high-yield mold release technology and is the most economical solution to NIL.

Nanoimprint Module
Mask Aligner add-on for NIL with high yield release technology