News from OAI
OAI is pleased to share valuable and interesting product and industry news. The company is continually developing new products and processes; exhibiting at international technical symposia and writing technical notes and application articles. news, articles and show schedules can be found here.
OAI Introduces the New Model 6000 Production Mask Aligner
A "Total Lithography Package" for Semiconductors, MEMS, Microfluidics, IOT and Packaging.
SAN JOSE, CA. May 01, 2015 – OAI, a leading Silicon Valley manufacturer of precision lithography equipment, announced today the new Model 6000 Mask Aligner for production. "The new mask aligner is a cost-effective, production tool that is designed for use in a variety of applications: semiconductor, MEMS, sensors, microfluidics, IOT and packaging", said Charles Turk, President of OAI.
Built on the venerable OAI modular platform, and with over 40 years of lithography equipment experience, the Model 6000 is a fully automated cassette-to-cassette system offering sub-micron resolution. It delivers performance that is unmatched at any price. The aligners feature Advanced Beam Optics with better than ±3% uniformity and a throughput of 180 wafer per hour in first mask mode. The result is higher yields.
Already proven in production, the Model 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000μ), warped wafers (up to 7 mm–10mm), thin substrates (down to 100μ thick), and thick photo resist. "With superb process repeatability, the Model 6000 is the perfect solution for all production environments", adds Charles Turk. Customers may choose either topside or optional backside alignment which uses Cognex™ pattern recognition software with OAI's pattern assist software. This unique software improves total throughput. For the complete lithography process, the Model 6000 Production Mask Aligner System can be integrated seamlessly with cluster tools.
For over 40 years, OAI has been a leading supplier of precision UV exposure and measurement equipment serving the MEMS, Semiconductor, Large Area Exposure Systems and Solar Markets.
OAI Introduces New, Non-contact, High Resolution Photolithography System Developed by Eulitha AG
NEW! A Non-Contact Tool for Photonic Patterning
San Jose, CA, March 24, 2014 – OAI, a Silicon Valley based manufacturer of precision, cost-effective equipment for the Semiconductor MEMS, PV/Solar, nanotechnology and microfluidic industries, introduces the new non-contact lithography system PhableR 100. This system as developed and manufactured by Eulitha AG, a Swiss based company specializing in novel nanolithography technologies. The PhableR 100 prints high resolution nano-structures for use in R&D as well as low-volume production. The system has the resolution of a stepper, the simplicity of a mask Aligner and is a low cost solution for photonic patterning.
OAI has signed a sales agreement with Eulitha AG to market, sell and provide technical support in the Americas for the PhableR 100 system. "We are very enthusiastic about how the Eulitha PhableR 100 fits into OAI's growing family of versatile cost-effective photolithography products," commented Dr. Charles Turk, President of OAI.
PhableR 100 System
The PhableR 100 system is based on the proprietary PHABLE (short for Photonics Enabler) photolithographic technology developed by Eulitha AG, which makes it possible to print high-resolution structures in a non-contact, proximity photolithography system. The resolution obtained with the PhableR 100 is essentially the same as that of a DUV projection lithography system, but without the complex and expensive optics and mechanics. For example, linear gratings with a half-pitch of 150nm can be printed with high uniformity with the new system. As an added advantage, the practically unlimited depth of focus of the image formed by the PhableR 100 system means that the high-resolution patterns can be printed with high uniformity even onto non-flat substrates, which are commonly encountered in photonics applications.
The PhableR 100 system can expose substrates with diameters up to 100mm using industry standard chrome-on-glass or phase-shifting masks. The mask and the substrate are loaded manually onto the system and the exposure process is controlled by an onboard computer. Standard i-line photoresists, both positive and negative tone, which are available from common vendors, can be used. Linear or curved gratings, 2D photonic-crystal type patterns with hexagonal or square symmetry can be printed with feature periods less than 300nm. The system may also be used like a standard mask-Aligner in either proximity or contact mode to print micron-scale structures. Targeted applications include research and development projects in photonics, fabrication of gratings for optical diffraction and spectroscopy, light extraction patterns on LEDs, patterned sapphire substrates and color filters.
Harun Solak, CEO of Eulitha AG stated: "We are proud to introduce a solution that will enable our customers to perform high resolution photolithography with a low-cost system for the first time. This equipment is a result of a long-term development effort at both the Paul Scherrer Institute and Eulitha."
About Eulitha AG
Eulitha AG is a spin-off company of the Paul Scherrer Institute, Switzerland. It specializes in the development of lithographic technologies for applications in photonics & biotech and also manufactures and markets nano-patterned samples/templates using its own PHABLE tools and state-of-the-art e-beam lithography systems. PHABLE is the brand name of its proprietary photolithography platform, which includes exposure tools and wafer patterning services.
NEW! Resistivity Testing Service for Conductive and Non-Conductive Materials
Answering the growing demand for resistivity testing, OAI is now offering conductive and non-conductive materials testing in their Resistivity Test Lab in San Jose, CA. Tests are completed within ten days of receipt of test sample material, and each test results in a comprehensive report. Resistance is measured in ohms; resistivity is measured in ohms/square (surface resistivity) and ohms•cm (volume resistivity).
About resistivity measurement
A material's resistance is simply defined as its inherent resistance to current flow in ohms. Surface resistivity (or sometimes called sheet resistance) describes the resistance within an area of the sample. To distinguish surface resistivity from resistance, surface resistivity is usually expressed in units of Ω/square.
Download for pricing and specs
News from InterSolar NA 2013
Robert Maher, VP Hunt Energy Enterprises, visits with Charlie Turk at InterSolar NA booth in San Francisco, CA.
(L to R, Mohan Bhan, Robert Maher, Charlie Turk)
Dr. Mohan Bhan Joins OAI – Solar Products Division
San Jose, CA – January 19, 2013. OAI is pleased to announce that Dr. Mohan Bhan has joined OAI as Director Solar Test Products Division.
Mohan Bhan is an industry veteran and brings with him rich technical and business operations experience of more than 24 years spanning across Semiconductor and Solar Industries. Mohan has recently led technology development of third generation, thin film solar cells on solar brush platform as, Chief Technology Officer, at Bloo Solar where he successfully developed world's highest efficient 3D based solar cells. Previously, he worked as Vice President of Engineering, at Moser Baer Solar Limited where he successfully commissioned and managed the operation of Applied Materials 40MW "SunFab" Turnkey line for the production of large area amorphous silicon based thin film photovoltaic modules. He brings an extensive technical background on the photovoltaic device and module engineering, testing and collecting performance in outdoor environment. He also has hands-on experience with the development of various types of solar cell materials such as mono and poly Si, a-Si, CdTe, CIGS and GaAs. He has worked on both standard and CPV based solar cells. His technical background further expands into the development of new solar module concepts and driving product certification (TUV and UL) programs. He has also worked at Applied Materials Inc. for 13 years where he held various technical, marketing and business management positions. Mohan has received his Ph.D. in Physics from Indian Institute of Technology, Delhi. He has been awarded various advanced research fellowships to work at European Organization for Nuclear Research (CERN), Imperial College of Science and Technology, University of Alabama in Huntsville, and Iowa State University.
His broad experience in solar cell development and testing makes him a valuable addition to the OAI family.
2015 TRAVEL GRANT PROGRAM
After a very successful 2014 TRAVEL GRANT PROGRAM, OAI is proud to offer again, for 2015, support to students & professors who have used or are using OAI's UV Exposure Systems in their research and are presenting their research at a technical conference. In 2014, OAI travel grants went to students presenting their work in MEMS, Nanotechnology, and Microfluidics.
Travel grants are available to the applicant who meets the following criteria:
- Applicant is presenting a research paper or poster
- Applicant is using or will be using an OAI system
- Applicant must acknowledge the use of OAI equipment in their paper and the travel support by OAI
- Amount of grant to be $350-$500 US Dollars
- Permission given to OAI to post your paper on the OAI company website
Please contact OAI for further information. It is OAI's goal to continue supporting research & contributing to the technologies of the future.
OAI equipment featured in University of Delaware research
June 6 – 10, 2016
June 12 – 14, 2016
Intersolar NA 2016
San Francisco, CA
July 20 – 21, 2016
EU PVSECF 2015
(As part of Intersolar Europe)