MEMS & Microfluidics

Mask Aligners

Model 200
Tabletop Contact Mask Aligner

Model 800E
Enhanced High Performance Front and Backside Mask Aligner

Model 6000
Fully Automated Optical Frontside or Backside Mask Aligner for Production

UV Light Sources & Exposure Systems

Model 30 Light Source
Collimated modular unit with excellent uniformity

Model 30 Enhanced UV Light Source
Collimated light source with added features

AML Wafer Bonders

AML Wafer Bonder
In-situ AML Wafer Bonder for anodic, silicon direct or compression bonding

Microfluidic Device Process

Contact Liquid Polymer Process
(CLiPP) Microfluidic prototype and production

UV Ozone Surface Treatment System

UV Ozone Surface Treatment System
For improved bonding and cleaning

Custom Solutions

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Semiconductor & Nanotechnology

Mask Aligners

Model 800E
Enhanced High Performance Front and Backside Mask Aligner

PhableR-100
High resolution, non-contact, proximity photolithography

Model 200
Table top contact mask Aligner

UV Light Sources & Exposure Systems

Model 30 Enhanced UV Light Source
Collimated light source with added features

Model 2000AF
Automated Flood Exposure Systems

Model 2000SM
Automated Edge Bead Exposure Systems

Model 2012AF
300mm Automated Food Exposure Systems

Model 2012SM
300mm Automated Edge Bead Exposure Systems

Nanoimprint Technology (NIL)

Nano Imprint Module
Aligner add-on with high yield release technology

Custom Solutions

Partner with OAI to solve your unique requirements
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Model 30E Enhanced UV Light Source

The OAI UV Model 30E Enhanced UV Light Source consists of a stand-alone Model 30 UV Light Source, a constant intensity controller, and a shutter timer, and a pull out drawer with a rotating chuck. Rotating the chuck during flood exposure improves exposure uniformity.