MEMS & Microfluidics

Mask Aligners

Model 200
Tabletop contact mask aligner

Model 200IR
Front side and IR backside mask aligner

Model 800FSA
Front side aligner

Model 800MBA
Semi-automated front side and optical backside mask aligner

Model 8000
Fully automated optical front side and backside mask aligner

Wafer Bonders

Wafer Bonder
In-situ wafer bonder for anodic, silicon direct or compression bonding

UV Light & Exposure Systems

Model 30 Enhanced Light Source
Collimated light source with added features

Microfluidic Device Process

Contact Liquid Polymer Process
(CLiPP) Microfluidic prototype and production

UV Ozone Surface Treatment System

UV Ozone Surface Treatment System
For improved bonding and cleaning

MEMS Specialized Equipment

Model VPE
Hydrofluoric acid vapor phase etcher

Model IRM
Infrared light wafer inspection microscope

Model WBI
IR light wafer bonding inspection device

Model CCB
Chip-to-chip bonder

Model WPWC
Wet process wafer chuck

Model WEDC
Wafer chuck for uniform electro-deposition

Custom Solutions

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Semiconductor & Nanotechnology

Mask Aligners

Model 200
Table top contact mask aligner

Model 800FSA
Front side aligner

Model 800MBA
Semi-automated front-side and optical backside mask aligner

Model 5000
Automated contact proximity mask aligner

UV Light & Exposure Systems

Model 30 Enhanced Light Source
Collimated light source with added features

Model 2000AF
Automated flood exposure systems

Model 2000SM
Automated edge bead exposure systems

Model 2012AF
300mm automated flood exposure systems

Model 2012SM
300mm automated edge bead exposure systems

Nanoimprint Technology (NIL)

Nano Imprint Module
Aligner add-on with high yield release technology

Custom Solutions

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oai model 300 uv light source

Model 30 UV Light Source

The OAI Model 30 UV Light Source (shown with optional stand) consists of a stand-alone light source, a constant intensity controller, and a shutter timer.

The Model 30 UV Light Source is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm, using the appropriate lamp (included). Output power ranges from 200 watts to 5 kilowatts. All OAI UV Light Sources are easily equipped with quick-change filter assemblies, enabling the user to customize the output spectrum with little effort. Optional remote exhaust fans are available.

Dual channel intensity controllers control light source intensity to a user-desired level and keep it constant over the lifetime of the lamp. Controllers’ feature dual-channel optical feedback allowing adjustment from one intensity level or spectral sensitivity to another. Intensity controllers feature a visual display for monitoring lamp intensity and power. Range scales automatically for different intensity levels. Audible alarms alert operator when a lamp change is required.

The shutter timer (used with freestanding exposure systems) activates the light source shutter. The timer range is from 0.1 to 999 seconds. An interface for controlling other shutter speeds is available.