Model 5000 Front-side, Automated Sub-micron Mask Aligner and Exposure System
The OAI Model 5000 Mask Aligner is an advanced, high-performance, fully-automated mask aligner and exposure tool that delivers ultra precise, front side, sub-micron alignment and resolution for the most demanding semiconductor device and surface MEMS applications. Its flexible design allows printing on various substrates - round or square - up to 200mm. The exposure system is compatible with photo resist in Near, Mid, or Deep UV range.
This versatile mask aligner is engineered for a wide variety of process applications. With its proven, modularized design, it delivers the scalability required to accommodate changing process parameters. It is designed primarily as a full production tool, but is available in a manual configuration for which it is well suited to low volume production, short-run engineering, or R&D applications. The tool may be used in proximity, contact or vacuum modes. Other notable features include auto pre-aligner, intensity controlling power supply system and, dual zoom CCD TV exposure lamp power up to 5000W and a low-maintenance design.