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Large Area Exposure Systems

Mask Aligners

Model 5000E
Mask aligner for large area substrates and display

UV Light & Exposure Systems

Model 2012AF
300mm automated flood exposure systems

Grande UV Light Source
Accommodates a full range of large substrates

Custom Solutions

Partner with OAI to solve your unique requirements

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oai large substrate mask aligner model 600

Model 600

Large Substrate Mask Aligner and UV Exposure System

The OAI Model 600 Large Substrate Mask Aligner System has many unique features that add to its exceptional versatility. It can be configured to suit the users unique needs, and is an excellent choice for ceramics, flat panels and Fodel™. This mask aligner has a wide range of options including special alignment optics, pressure sensitive chucks (for use with brittle substrates), and multi-spectral exposure systems, enabling the user to select the exposing wavelength (Near, Mid or Deep UV).

With its interchangeable subsystem modules, the system can be configured to meet standard applications as well as many unique or unusual requirements. Light Sources (using special, mirrored optics) are available up to 5KW for substrates up to 20 inches square.