Semiconductor & Nanotechnology

Mask Aligners

PhableR-100
High resolution, non-contact, proximity photolithography

Model 200
Table top contact mask Aligner

Model 800E
Enhanced High Performance Front and Backside Mask Aligner

UV Light Sources & Exposure Systems

Model 30 UV Light Source
Collimated, modular unit with excellent uniformity

Model 30 Enhanced UV Light Source
Collimated light source with added features

Model 2000AF
Automated flood exposure systems

Model 2000SM
Automated edge bead exposure systems

Model 2012AF
300mm automated flood exposure systems

Model 2012SM
300mm automated edge bead exposure systems

Custom Solutions

Partner with OAI to solve your unique requirements
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Enabling Technologies

Wafer Sorters

Wafer Sorter
Handling for cassettes or FOUPS up to 300mm wafers

Custom Solutions

Partner with OAI to solve your unique requirements
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oai-nanoimprint module

Nanoimprint Module
(featuring NIL Technology)

The OAI Nanoimprint Module System is a modular add-on that may be used on any mask Aligner. This innovative technology was developed at Hewlett Packard as a low-cost solution for research and development efforts. It enables the use of high-yield mold release technology and is adaptable to virtually all mask Aligner systems.